Items where Author is "Yoshida, Masafumi"

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Article

Hamada, Toshiyuki and Nishida, Kazuki and Yoshida, Masafumi (2024) Impact of Ar/CF4 Mixed Gas Flow Rate on Silicon Etching Using Surface Discharge Plasma. Applied Sciences, 14 (10). p. 4252. ISSN 2076-3417

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