Items where Author is "Hamada, Toshiyuki"

[up] Up a level
Group by: Item Type | No Grouping
Number of items: 1.

Hamada, Toshiyuki and Nishida, Kazuki and Yoshida, Masafumi (2024) Impact of Ar/CF4 Mixed Gas Flow Rate on Silicon Etching Using Surface Discharge Plasma. Applied Sciences, 14 (10). p. 4252. ISSN 2076-3417

This list was generated on Fri Nov 1 03:38:00 2024 UTC.